Puyo M., Topka K. C., Diallo B., Laloo R., Genevois C., Florian P., Sauvage T., Samelor D., Senocq F., Vergnes H., Caussat B., Menu M. J., Pellerin N., Vahlas C., Turq V.
Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films
Thin Solid Films # 735 -
doi : 10.1016/j.tsf.2021.138844