Catégorie

Interne

Centre

Publications

10.1016/j.tsf.2021.138844
1
2021-11-03
2021
Puyo M., Topka K. C., Diallo B., Laloo R., Genevois C., Florian P., Sauvage T., Samelor D., Senocq F., Vergnes H., Caussat B., Menu M. J., Pellerin N., Vahlas C., Turq V.
Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films
Thin Solid Films #
735 -
doi : 10.1016/j.tsf.2021.138844

inrs_publi_centers

4830
CEMHTI
0
4830
0