Topka K. C., Diallo B., Samelor D., Laloo R., Sadowski D., Genevois C., Sauvage T., Senocq F., Vergnes H., Turq V., Pellerin N., Caussat B., Vahlas C.
Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures
Surface & Coatings Technology # 407 13-
doi : 10.1016/j.surfcoat.2020.126762